Thin Film and Surface Characterization with X-ray photoelectron spectroscopy (XPS)

Abstract

XPS, or X-ray Photoelectron Spectroscopy, is a technique used to analyze the chemical composition, chemical state, and electronic state of elements present in a material with high sensitivity to the surface. It measures elemental composition at the parts-per-thousand range and is able to provide information about the oxidation state of materials. In an upcoming lecture, I will cover the working principles, advantages, limitations, and application areas of this widely-used method in the analysis of surface chemical structure. I will also present examples of chemical analysis on different surfaces, such as metal, metal oxide, and polymer, to provide a better understanding of the subject.